ALLENTOWN, Pa. — TEA Systems Corp. introduced Weir PW, a software suite for process control in lithography applications. Using custom models for wafer and field systematic applications, the software ...
To address the urgent issue of how to manage process variability in the early stages of design creation, Mentor Graphics Corp. today announced its production-proven Calibre Litho-Friendly Design (LPD) ...
NVIDIA’s cuLitho software library for computational lithography is being integrated by TSMC, ASML and into their software, manufacturing processes and systems for NVIDIA’s Hopper architecture GPUs. “ ...
Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...
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Intel installs industry's first commercial high-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A
B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.
Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...
Nvidia has developed a software library for computational lithography, which it believes will massively improve chip design development times, and reduce the number of data centers chip fabs have to ...
From its origins more than 200 years ago as an efficient way to publish theatrical works, lithographic printing has grown to be the preferred method for a vast range of print projects. Currently, the ...
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